PVD Blog

Partners in Innovation: Making Advancements in Off-Axis Sputtering with The Ohio State University

In September, we announced our exclusive licensing agreement with The Ohio State University to commercialize a patent-pending deposition technique developed by faculty member Dr. Fengyan Yang. The innovative technology is based on off-axis sputtering and Dr. Yang's research group has demonstrated how the new process can be used to grow a broad variety of epitaxial films that have a crystalline quality that rivals more expensive processes, such as molecular beam epitaxy (MBE) and pulsed laser deposition (PLD). The new capabilities developed at the university will meet the growing demand in physics, chemistry, and material science for entirely new classes of materials in both academic and industrial research and development.
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Customer Application Spotlight: Northwestern University's Pulsed Laser Deposition Core Facility

At PVD Products, we work with each of our customers to ensure that they get a custom-made deposition system that meets their individual needs while conforming to their budget and schedule requirements. We are highlighting how some of our customers use our products in unique and creative ways. We kick things off with an interview of D. Bruce Buchholz.
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Designing for Rate and Uniformity Part 4: Numerical Modeling for Thin Film Deposition

In Part 3 of this blog series, we discussed designing deposition systems with linear substrate motion or continuous web coating. As promised, this blog will show the results of modeling of the plate coating example we defined previously.
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Designing for Rate and Uniformity Part 3: Linear Motion Systems

In the previous blogs of this series, we highlighted that the properties of the film are central to the design of a deposition instrument, with film thickness and uniformity being critical parameters for performance. Throughput predictions help to determine and maximize the system ROI. Proper design can also identify and trim away unnecessary cost elements, reducing the “I” in ROI. In part 2, we examined design considerations for rotating substrate. This blog will look at coating methods for linear motion systems.
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PVD Products Licenses Technology from The Ohio State University for Exclusive Deposition Technology Development

PVD Products, Inc. is proud to announce our entrance into an exclusive licensing agreement with The Ohio State University for thin film deposition technology developed in the University’s Department of Physics. Through this agreement, PVD will commercialize patent-pending Ohio State technology for deposition of high quality thin films via sputtering.
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Designing for Rate and Uniformity Part 2: Steps for Best Sputter Deposition System Design

In Part 1 of our deposition rate and uniformity series, we discussed the key considerations for deposition tool performance. The second part of our series takes a look at the steps for deposition system design based on rate and uniformity.
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Designing for Rate and Uniformity Part 1: Considerations for Deposition Tool Performance

What are the key parameters of interest to anyone selecting a tool for thin film deposition? They are, of course, the film properties themselves. Concerning the process of growing the film, the most fundamental are the deposition rate and film thickness uniformity. The rate is important to reach proper film thickness in single or multi-layers, and to achieve stoichiometry in co-deposited films. The rate also correlates to how economically viable the system will be via the throughput: how long it will take to create the layer needed to serve a particular purpose. The uniformity determines how much of the film area will hold to these metrics over the entire area of the substrate, to within a desired tolerance.
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5 Tips for Managing a Major Thin Film Deposition System Upgrade

Thin film deposition systems are famously long-lived. With proper maintenance, instruments can last for decades! That said, with the ever-advancing march of technology, most systems eventually fall short of demands for higher throughput or improved yield. When that occurs, the deposition system will generally require a major overhaul in order to accommodate new modes of automation and advanced computer controls. When upgrades are not possible or feasible, it may be time to replace the entire system. The primary concern during such a change is maintaining consistency of performance between the old and new systems. It is imperative that films produced from the new deposition tool match that of the previous tool.
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The Expanding Field of Combinatorial Thin Film Deposition: Participating in Advancement at the NIST Workshop

Talk about a field that is exploding with innovation potential! Two members of the PVD Products team recently had the chance to attend a workshop at the National Institute of Standards and Technology (NIST) on accelerated discovery for energy materials.
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More than a Motto: Designing a Recipe for Deposition System Success

For decades, PVD has been the leader in designing and building custom deposition systems. Our motto is "Creativity, Collaboration, Communication." What does that mean for our customers? Below we outlined how each of these words are applied into our process daily and how it translates into customer success.
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