PVD Blog

It’s All in the Delivery: The Evolution of Combinatorial Deposition

To close out 2018, we exhibited at the Fall Materials Research Society conference. As we usually do during the show, we took time to attend technical talks. Knowing the course that research is taking helps us to best meet the needs of researchers. Besides, the discoveries themselves are fascinating to take in! We’re reviewing what we learned and building on that knowledge as we kick off 2019. They say it’s all in the delivery—and this is becoming truer of combinatorial deposition. The relative flux of the sputtered components is not the only determinant of the properties and performance of a combinatorial candidate material. Two of the talks we attended brought this point home:
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Custom Thin Film Deposition Systems: 7 Reasons to BUY Instead of DIY

Advanced deposition research and production come with unique needs, and when faced with the limitations of commercial deposition systems, it often seems most straightforward to do it yourself (DIY). Building a custom deposition system can be its own learning experience, but unless building deposition systems is a direct component of your research or production, your resources would generally be better spent buying a custom-made product from specialists.
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Customer Application Spotlight: Thin Film Deposition Advancements at the University of Leeds

To showcase the work our customers do and their experience with our thin film deposition systems, we’re continuing our series of blogs that highlight our customers and their unique thin film applications. We continue the series with Dr. Gin Jose.
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Partners in Innovation: Making Advancements in Off-Axis Sputtering with The Ohio State University

In September, we announced our exclusive licensing agreement with The Ohio State University to commercialize a patent-pending deposition technique developed by faculty member Dr. Fengyan Yang. The innovative technology is based on off-axis sputtering and Dr. Yang's research group has demonstrated how the new process can be used to grow a broad variety of epitaxial films that have a crystalline quality that rivals more expensive processes, such as molecular beam epitaxy (MBE) and pulsed laser deposition (PLD). The new capabilities developed at the university will meet the growing demand in physics, chemistry, and material science for entirely new classes of materials in both academic and industrial research and development.
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Customer Application Spotlight: Northwestern University's Pulsed Laser Deposition Core Facility

At PVD Products, we work with each of our customers to ensure that they get a custom-made deposition system that meets their individual needs while conforming to their budget and schedule requirements. We are highlighting how some of our customers use our products in unique and creative ways. We kick things off with an interview of D. Bruce Buchholz.
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Designing for Rate and Uniformity Part 4: Numerical Modeling for Thin Film Deposition

In Part 3 of this blog series, we discussed designing deposition systems with linear substrate motion or continuous web coating. As promised, this blog will show the results of modeling of the plate coating example we defined previously.
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Designing for Rate and Uniformity Part 3: Linear Motion Systems

In the previous blogs of this series, we highlighted that the properties of the film are central to the design of a deposition instrument, with film thickness and uniformity being critical parameters for performance. Throughput predictions help to determine and maximize the system ROI. Proper design can also identify and trim away unnecessary cost elements, reducing the “I” in ROI. In part 2, we examined design considerations for rotating substrate. This blog will look at coating methods for linear motion systems.
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PVD Products Licenses Technology from The Ohio State University for Exclusive Deposition Technology Development

PVD Products, Inc. is proud to announce our entrance into an exclusive licensing agreement with The Ohio State University for thin film deposition technology developed in the University’s Department of Physics. Through this agreement, PVD will commercialize patent-pending Ohio State technology for deposition of high quality thin films via sputtering.
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Designing for Rate and Uniformity Part 2: Steps for Best Sputter Deposition System Design

In Part 1 of our deposition rate and uniformity series, we discussed the key considerations for deposition tool performance. The second part of our series takes a look at the steps for deposition system design based on rate and uniformity.
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Designing for Rate and Uniformity Part 1: Considerations for Deposition Tool Performance

What are the key parameters of interest to anyone selecting a tool for thin film deposition? They are, of course, the film properties themselves. Concerning the process of growing the film, the most fundamental are the deposition rate and film thickness uniformity. The rate is important to reach proper film thickness in single or multi-layers, and to achieve stoichiometry in co-deposited films. The rate also correlates to how economically viable the system will be via the throughput: how long it will take to create the layer needed to serve a particular purpose. The uniformity determines how much of the film area will hold to these metrics over the entire area of the substrate, to within a desired tolerance.
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