PVD Blog

Designing for Rate and Uniformity Part 3: Linear Motion Systems

In the previous blogs of this series, we highlighted that the properties of the film are central to the design of a deposition instrument, with film thickness and uniformity being critical parameters for performance. Throughput predictions help to determine and maximize the system ROI. Proper design can also identify and trim away unnecessary cost elements, reducing the “I” in ROI. In part 2, we examined design considerations for rotating substrate. This blog will look at coating methods for linear motion systems.
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PVD Products Licenses Technology from The Ohio State University for Exclusive Deposition Technology Development

PVD Products, Inc. is proud to announce our entrance into an exclusive licensing agreement with The Ohio State University for thin film deposition technology developed in the University’s Department of Physics. Through this agreement, PVD will commercialize patent-pending Ohio State technology for deposition of high quality thin films via sputtering.
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Designing for Rate and Uniformity Part 2: Steps for Best Sputter Deposition System Design

In Part 1 of our deposition rate and uniformity series, we discussed the key considerations for deposition tool performance. The second part of our series takes a look at the steps for deposition system design based on rate and uniformity.
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Designing for Rate and Uniformity Part 1: Considerations for Deposition Tool Performance

What are the key parameters of interest to anyone selecting a tool for thin film deposition? They are, of course, the film properties themselves. Concerning the process of growing the film, the most fundamental are the deposition rate and film thickness uniformity. The rate is important to reach proper film thickness in single or multi-layers, and to achieve stoichiometry in co-deposited films. The rate also correlates to how economically viable the system will be via the throughput: how long it will take to create the layer needed to serve a particular purpose. The uniformity determines how much of the film area will hold to these metrics over the entire area of the substrate, to within a desired tolerance.
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5 Tips for Managing a Major Thin Film Deposition System Upgrade

Thin film deposition systems are famously long-lived. With proper maintenance, instruments can last for decades! That said, with the ever-advancing march of technology, most systems eventually fall short of demands for higher throughput or improved yield. When that occurs, the deposition system will generally require a major overhaul in order to accommodate new modes of automation and advanced computer controls. When upgrades are not possible or feasible, it may be time to replace the entire system. The primary concern during such a change is maintaining consistency of performance between the old and new systems. It is imperative that films produced from the new deposition tool match that of the previous tool.
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The Expanding Field of Combinatorial Thin Film Deposition: Participating in Advancement at the NIST Workshop

Talk about a field that is exploding with innovation potential! Two members of the PVD Products team recently had the chance to attend a workshop at the National Institute of Standards and Technology (NIST) on accelerated discovery for energy materials.
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More than a Motto: Designing a Recipe for Deposition System Success

For decades, PVD has been the leader in designing and building custom deposition systems. Our motto is "Creativity, Collaboration, Communication." What does that mean for our customers? Below we outlined how each of these words are applied into our process daily and how it translates into customer success.
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Deposition System Design: Considerations for Ion Beam Source Selection

Ion sources can be used for a variety of applications in thin film deposition and etching. For example, they can be used for substrate pre-cleaning, reactive deposition of oxide and nitrides (ion beam assisted deposition), and ion beam milling. When selecting and designing a deposition system that uses an ion source, many factors come into play. Some design features are dictated by the application, and some can be balanced against cost and performance. Below are five factors to keep in mind as you select an ion beam source.
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Advancing Thin Film Deposition Methodology: Three Factors for High Throughput Deposition

Complex coating processes, such as combinatorial sputter deposition and pulsed laser deposition (PLD), require significant attention to detail, and successful results rely on quality equipment. PVD Products is continually developing innovative solutions to overcome common technical challenges that accompany newer processes for PLD and combinatorial deposition. The following improvements are three examples of these solutions:
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The Material Discovery Funnel: A Six-Step Process for Advanced Material Development

The forward march of technology relies on continuous improvement of critical components such as semiconductors, batteries, fuel cells, and the like. In time, every component runs up against performance constraints established by fundamental physics and chemistry. Overcoming those restrictions requires the development of unique
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