The systems typically come with turbo molecular pumps backed by Edwards dry pumps. On most systems, all valves on the system are electro-pneumatic for ease of operation and will automatically close to a safe position on power failure. A standard Mass Flow Control unit (as opposed to a needle valve) provides for precise and reproducible process gas flow during deposition. Systems with multiple MFCs are readily available. Deposition pressure is monitored and controlled using a heated capacitance manometer whose output is fed into a closed-loop VAT gate valve. The desired process pressure can then be accurately controlled from 1 to 500 mTorr. Base vacuum is measured with a Bayard Alpert Ion gauge. The chamber and rough line pressures are also monitored with Convectron gauges.
| System | Box or Cylinder | Max Substrate Size | Pumping Package |
| Nano PLD | Box | 2” (50.4-mm) | 300 l/sec |
| PLD 2000 | Box | 2” (50.4-mm) | 300 l/sec |
| PLD 3000 | Box | 3” (75-mm) | 500 l/sec |
| PLD 4000 | Box | 4” (100-mm) | 700 l/sec |
| PLD 5000 | Box | 5” (125-mm) | 700 l/sec |
| PLD 6000 | Box | 6” (150-mm) | 700 l/sec |
| PLD 8000 | Box | 8” (200-mm) | 1,200 l/sec |
| PLD 12000 | Box | 12” (300-mm) | 1,200 l/sec |
| PLD/MBE 2100 | Cylinder | 2” (50.4-mm) | 500 l/sec |
| PLD/MBE 2300 | Cylinder | 2” (50.4-mm) | 700 l/sec |
| PLD/MBE 2500 | Cylinder | 2” (50.4-mm) | 700 l/sec |
| PLD/MBE 2100L | Cylinder | 2” (50.4-mm) | 500 l/sec |
| PLD/MBE 2300L | Cylinder | 2” (50.4-mm) | 700 l/sec |
| PLD/MBE 2500L | Cylinder | 2” (50.4-mm) | 700 l/sec |
