Research and development is what inspires PVD Products day in and day out. The company was founded on Dr. James Greer's desire to expand thin film physical vapor deposition (PVD) techniques. Our collaborative approach allows PVD Products to meet the research needs of high profile universities, national labs, and small and large corporations around the world, including places such as MIT and NIST.
Starting up or scaling up, PVD Products is your thin film deposition system partner. Our equipment utilizes the highest quality vacuum and electronic components for long-term reliable operation with minimal maintenance. We help commercial businesses translate needs into functional hardware to get the system built and in the production facility on time and on budget.
PVD Products realizes that a standard system may not achieve your desired results. Our fundamental understanding of your process allows us to build custom thin film deposition systems, combinatorial deposition tools, and reel-to-reel deposition equipment for the coated conductor market. We enable rapid process development that best suits research goals or production demands.
WATCH OUR FREE ONE-HOUR WEBINAR:Epitaxial Nitride Thin Films and Heterostructures: Emerging Applications and Future Prospects
This insightful one-hour webinar will help researchers and developers to better understand:• Epitaxial nitride thin film and heterostructure growth
VIEW OUR FREE ONE-HOUR WEBINAR:Innovations in high-power impulse magnetron sputtering (HiPIMS)
This insightful one-hour webinar will help researchers and developers to better understand:
• Why the HiPIMS plasma discharge is unique and imparts important properties to thin films
• How wear-resistant coatings are applied to machine parts for tribological coating
• How to obtain deposition rates on par with DC magnetron sputtering but still have higher-performing films
• What the manipulation of voltage pulses in the HiPIMS discharge can offer for tailoring film properties
• How to obtain conformal coatings, even with deep structures on substrate or with 3D parts
Pulsed Laser Deposition (PLD) Systems use a laser beam to vaporize a solid target material in order to produce a thin film with exactly the same chemical composition as the original target material. The PLD process enables the deposition of many materials over a wide range of background gas compositions and pressures.
PVD Products provides a wide variety of custom physical vapor deposition systems. Shown here is a dual chamber system including PLD and magnetron sputtering connected via a dual wafer load lock. PVD can provide combination systems like this or completely integrated custom systems specific to your requirements.
PVD Products, Inc. provides a full range of coated conductor systems for depositing High Temperature Superconductor (HTS) materials and buffer layers on continuous metal tapes. Coated conductor deposition systems are available based on pulsed laser deposition, magnetron sputtering, and evaporation with Ion Beam Assisted Deposition. Reel-to-reel systems allow for deposition on substrate areas up to 10 square meters in a single run.
PVD Products manufactures sputtering systems for depositing metal and dielectric thin films on substrates up to 300 mm in diameter. Various magnetron sputtering sources, using RF, DC or pulsed DC power, are operated singly or in co-deposition mode to produce a wide variety of film compositions.
PVD Products’ complete thermal and electron beam evaporation systems are designed to meet the customer’s specific deposition needs. These systems can contain single or multiple thermal sources, multi-pocket e-beam sources, and multi-gun sources as required. Linear e-beam sources are also available.