PLD 5000 & PLD 6000 Deposition Systems

The PVD Products PLD 5000 and PLD 6000 are capable of depositing high quality uniform films on substrates up to 6 inches (150 mm) in diameter. Our systems use a box-style chamber with a large front-mounted hinged door. This allows for very easy access to the substrate and target.

Download PLD 5000 & 6000 Brochure

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The PLD 6000 is designed to deposit uniform multilayer films over 150 mm diameter wafers. The system is fully computer controlled.

Deposition Software Design

The PLD 5000 and PLD 6000 comes with a complete software package and can be used to grow large area multilayer and combinatorial thin films. Check out our deposition software design services for your next PLD system.

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Customize A System

Do you know the specifications you need to reach?
Contact us to discuss a custom system.

Specifications

Maximum Substrate Size

Holds one 6-inch diameter substrate or four 2-inch diameter substrates. Custom substrate holders are available on request.

Operating Pressure Range

5 x 10-7 Torr base to 300 mTorr

Target to Substrate (Throw) Distance

Variable from 4 inches to 6 inches (affects maximum temperature, thickness, and composition specifications)

Base Pressure of the Main Chamber

P < 5 x 10-7 Torr guaranteed, with system at room temperature without targets (5 x 10-8 Torr with load lock and 5 x 10-9 Torr with bake out options)

Maximum Substrate Temperature

950°C (in oxygen) for non-transparent substrates and 850°C for transparent substrates (such as LaAlO3 and sapphire). No thermal paste or bonding required.

Target Size

Three 6-inch diameter targets (maximum diameter)

Raster Path Length

5.8 inches

Vacuum Chamber

Box-style chamber with easy substrate and target changes. The chamber is compatible with single or multiple magnetron sources as well as ion beam sources.

Temperature Uniformity

±6°C across 6-inch diameter substrate

Film Thickness Uniformity

±5% over 90% of a 6-inch diameter substrate (6-inch throw) for 500-nm thick films

Nominal Angle of Incidence

Of the laser beam on target: 60°

Operational Wavelength

248 nm (KrF) or 193 nm (ArF)

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