The PVD Products PLD 5000 and PLD 6000 are capable of depositing high quality uniform films on substrates up to 6 inches (150 mm) in diameter. Our systems use a box-style chamber with a large front-mounted hinged door. This allows for very easy access to the substrate and target.
The PLD 6000 is designed to deposit uniform multilayer films over 150 mm diameter wafers. The system is fully computer controlled.
Holds one 6-inch diameter substrate or four 2-inch diameter substrates. Custom substrate holders are available on request.
5 x 10-7 Torr base to 300 mTorr
Variable from 4 inches to 6 inches (affects maximum temperature, thickness, and composition specifications)
P < 5 x 10-7 Torr guaranteed, with system at room temperature without targets (5 x 10-8 Torr with load lock and 5 x 10-9 Torr with bake out options)
950°C (in oxygen) for non-transparent substrates and 850°C for transparent substrates (such as LaAlO3 and sapphire). No thermal paste or bonding required.
Three 6-inch diameter targets (maximum diameter)
Box-style chamber with easy substrate and target changes. The chamber is compatible with single or multiple magnetron sources as well as ion beam sources.
±6°C across 6-inch diameter substrate
±5% over 90% of a 6-inch diameter substrate (6-inch throw) for 500-nm thick films
Of the laser beam on target: 60°
248 nm (KrF) or 193 nm (ArF)