PVD Products provides a full range of reel-to-reel sputtering systems for deposition of buffer layers for HTS CC applications such as CeO2, LaMnO3, and homoepitaxial MgO. We have a wide range of product offerings for sputtering systems including:
PVD Products’ sputtering tools are field-proven deposition systems for R&D and production of up to 1 km lengths of tape. These systems can be used to deposit epitaxial layers of CeO2, LaMnO3, homo-epitaxial MgO and other buffer layers onto heated substrates (up to 850°C). They can also be used to deposit Ag over-layers onto cooled substrates. Tape widths can vary from 4 to 12 mm in a multi-pass type deposition system or in much wider widths such as 40 or 100 mm wide formats depending on customer needs.
If you already own a coated conductor system, coated conductor components are also available.
Our sputtering systems have been designed for both R&D and production of buffer layers for long lengths of tapes up to 1 km. This computer controlled reel-to-reel system will meet your most demanding deposition requirements and is compatible with a wide variety of metallic tape compositions, widths, and thicknesses. PVD also provides other types of deposition systems for coated conductor applications, including PLD, IBAD, and evaporation.