PVD Products is now providing customers with a full range of high quality targets for magnetron and ion beam sputtering, as well as Pulsed Laser Deposition applications. These targets include standard metals, oxides, nitrides, carbides, and other complex formulations as required. Targets are available in sizes ranging from 10 mm up to over 350 mm in diameter. Small and large rectangular targets as well as evaporation materials are also available on request.

The Kurchatov Institute in Moscow has placed an order for a second Pulsed Laser Deposition System. The system, based on PVD Products’ Nano PLD platform, will include a magnetron sputter source and dual wafer loadlock chamber.

PVD Products will be exhibiting at the upcoming 40th International Conference on Metallurgical Coatings and Thin Films (ICMCTF) at the Town and Country Convention Center, San Diego, CA on April 30 and May 1. Please visit us at Booth 217 to discuss your thin film needs. PVD Products offers a wide variety of thin film deposition tools including sputtering, evaporation, pulsed laser deposition and custom systems.

PVD Products has shipped a UHV magnetron sputter deposition system to the NASA Kennedy Space Center this week. The loadlocked system includes three 3-inch in-situ tilting UHV magnetron sputter sources for metal deposition on six inch diameter wafers. Thickness uniformity was +/- 1.5% over a 150 mm diameter wafer. The system is fully computer controlled for multilayer film growth.

Earlier this month PVD Products has completed the installation of two reel-to-reel Coated Conductor systems for an overseas customer. These include an IBAD sputter deposition system based on RF ion beam sputtering of a MgO target with an RF ion beam assist on the multi-lane substrate surface for the epitaxial growth of MgO. The second tool was a multi-lane reel-to-reel CC system for the sputter deposition of CeO2 and other buffer layers as well as Ag over layers.

PVD Products shipped a PLD/MBE 2300 deposition tool with a magnetron sputter source to Stanford University today. Researchers at Stanford will use this tool for the deposition of oxide mixed ion and electron conductors . Materials such as CeO2 doped with Gd, Sm etc., and perovskites like LaSrFeOx , LaBaFeOx, SrTiFeOx will be deposited via PLD. Studies of the surface chemistry will be undertaken on these materials for development of electrodes or catalysis for solid oxide fuel cells and electrolyzers. The combination of PLD and magnetron sputtering makes the PLD/MBE 2300 system an ideal tool for this type of research.

PVD Products shipped two large reel-to-reel coated conductor tools today to an overseas customer. These included an ion beam sputter IBAD tool for the growth of epitaxial MgO onto cooled Hasteloy tapes. The second machine is a magnetron sputtering tool for the deposition of oxide buffer layers such as CeO2 and LaMnO3 onto heated coated-conductor tapes, as well as Ag onto cooled tapes. Both machines handle 10 mm and 12 mm wide tapes, 1 km in length, in a multi-roll arrangement to provide high throughput.

PVD Products has hired Dr. Richard Myer as its Technical Sales Manager for PVD’s Sputtering Product Line of thin film deposition systems. Dr. Myer received his Ph.D. in plasma physics from the University of Rochester and has leveraged his background in plasma heating in the sale of plasma processing equipment for PVD, CVD, and Etch while at Applied Science and Technology and ENI. Dr. Myer has also worked at commercializing a variety of technologies involving high voltage solid state power systems at Diversified Technologies, Inc., (Bedford, MA) and atmospheric pressure plasma processes at Atmospheric Plasma Solutions, Inc. (Cary, NC). Dr. Myer’s hands-on experience with plasma technology and plasma processing will assist our leading-edge customers in configuring PVD systems to meet their processing needs.

Shanghai Jiao Tong University has placed a purchase order for a large reel-to-reel sputter deposition systems with PVD Products. The sputtering tool will include multiple linear RF sputtering sources for the deposition of CeO2 and other buffer layers onto 1 km lengths of 1 cm wide tape. The tool will make use of PVD's multi-roll technology and large-area substrate heaters. This system will operate at very high tape speeds providing high throughput for this application. SJTU has placed many previous orders with PVD Products for large R2R coated conductor technology.