PVD Products is now providing customers with a full range of high quality targets for magnetron and ion beam sputtering, as well as Pulsed Laser Deposition applications. These targets include standard metals, oxides, nitrides, carbides, and other complex formulations as required. Targets are available in sizes ranging from 10 mm up to over 350 mm in diameter. Small and large rectangular targets as well as evaporation materials are also available on request.

The Kurchatov Institute in Moscow has placed an order for a second Pulsed Laser Deposition System. The system, based on PVD Products’ Nano PLD platform, will include a magnetron sputter source and dual wafer loadlock chamber.

PVD Products will be exhibiting at the upcoming 40th International Conference on Metallurgical Coatings and Thin Films (ICMCTF) at the Town and Country Convention Center, San Diego, CA on April 30 and May 1. Please visit us at Booth 217 to discuss your thin film needs. PVD Products offers a wide variety of thin film deposition tools including sputtering, evaporation, pulsed laser deposition and custom systems.

PVD Products, Inc. will be exhibiting at European Conference on Applied Superconductivity (EUCAS) to be held in Genoa Italy. Dates are September 15-19th, 2013. PVD will be introducing its new Solution Dip Planarization Products at this meeting as well as featuring its other coated conductor tools including reel-to-reel IBAD, PLD, and sputter systems.

PVD Products has shipped a UHV magnetron sputter deposition system to the NASA Kennedy Space Center this week. The loadlocked system includes three 3-inch in-situ tilting UHV magnetron sputter sources for metal deposition on six inch diameter wafers. Thickness uniformity was +/- 1.5% over a 150 mm diameter wafer. The system is fully computer controlled for multilayer film growth.

Earlier this month PVD Products has completed the installation of two reel-to-reel Coated Conductor systems for an overseas customer. These include an IBAD sputter deposition system based on RF ion beam sputtering of a MgO target with an RF ion beam assist on the multi-lane substrate surface for the epitaxial growth of MgO. The second tool was a multi-lane reel-to-reel CC system for the sputter deposition of CeO2 and other buffer layers as well as Ag over layers.

PVD Products will be exhibiting at the International Vacuum Congress-19 in Paris, France, Booth #2. The exhibit dates are Sept. 10-12th. Please stop by the booth to discuss your specific deposition systems needs. We look forward to meeting you there!

PVD Products will be exhibiting at the upcoming EMRS in Strasbourg May 28-30th. Please stop by our booth to learn about our products. http://www.emrs-strasbourg.com/

PVD Products shipped a PLD/MBE 2300 deposition tool with a magnetron sputter source to Stanford University today. Researchers at Stanford will use this tool for the deposition of oxide mixed ion and electron conductors . Materials such as CeO2 doped with Gd, Sm etc., and perovskites like LaSrFeOx , LaBaFeOx, SrTiFeOx will be deposited via PLD. Studies of the surface chemistry will be undertaken on these materials for development of electrodes or catalysis for solid oxide fuel cells and electrolyzers. The combination of PLD and magnetron sputtering makes the PLD/MBE 2300 system an ideal tool for this type of research.