PVD Products has installed a turn-key combinatorial sputter deposition system for 300 mm diameter wafers in a major semiconductor fab. This system includes four PVD Products Titan in-situ tiltable magnetron sputter sources mounted on motorized Z-stages. Each source is connected to both an RF and DC power supply through a programmable RF/DC switch. The 300 mm wafer is transferred to a wafer holder mounted to a vacuum compatible X-Y stage with 1 micron positioning resolution. Co-sputtering from up to four sources through a metal mask creates a well defined pad on the wafer. Using the X-Y stage to step location and using the sources at different power levels and/or varying target to substrate distances allows the deposition of a wide range of varying material compositions in a computer controlled fashion. This system is also mated to a central robot wafer handler.

PVD Products had installed a unique turn-key PLD system for 300 mm wafers in a large semiconductor fab. This system is married to a central robot and wafer handler. Besides using one of PVD's unique X-Y-Θ type target manipulator this PLD this system also included a multipocket electron beam evaporation unit and high temperature heater.

PVD Products has installed a turn-key coated conductor sputtering system for the deposition of cerium oxide buffer layers and protective silver metal layers onto 1 cm wide metal tapes. The system utilizes PVD Products multi-lane tape transport system with a 6" x 3" rectangular magnetron source for large area deposition. Included with the system is a substrate heater used for cerium oxide buffer layers and a substrate cooling stage for deposition of silver protective layers.The system is completely computer controlled. The system can deposit 1 micron of Ag at a tape speed of 15 m/hour.

PVD Products has been awarded a Phase I SBIR entitled "High-Throughput Experimentation Physical Vapor Deposition (PVD) Chamber for Accelerated Microelectronics Materials Research and Development" from the Defense Microelectronics Activity group located in McClellan, CA. Under this program, PVD Products will design a system for co-sputtering using novel heating techniques to grow a large library of thin films of varying compositions and microstructures. The goal of this Phase I SBIR program is to provide the design of a large multi-source system with the capability of growing a minimum of 100 test pad combinations of materials on a 200 mm diameter wafer.

PVD Products has successfully completed the installation of its third turnkey coated conductor PLD tape machine at Shanghai Jiao Tong University. These machines have been used to deposit REBCO thin films onto 1 cm wide tapes over 200 meters long, with critical currents above 240 amps. This system utilizes a multi-roll contact style heater and can deposit both buffer layers and superconductors and makes use of PVD Products' unique target manipulator.

PVD Products successfully completed the installation of a unique PLD system at the University of Leeds in England. This system has two complete optical trains for growing thin films. One optical train is for a FS laser operating at 800 nm, and one optical for an excimer laser operating at either 248 or 193 nm.

PVD Products is pleased to announce that it has selected Applied Science Korea to be its exclusive distributor in Korea for its full line of thin film deposition products. Applied Science Korea has a strong background in thin film deposition, UHV vacuum techniques, RHEED, and materials processing. Their expertise will provide both its Korean customers and PVD Products with strong technical and sales support.

PVD Products books an order for a unique multi-target MAPLE and RIRPLD system that will be delivered to Jefferson Labs and used with the JLABS Free Electron Laser.