PVD Blog

Designing for Rate and Uniformity Part 4: Numerical Modeling for Thin Film Deposition

In Part 3 of this blog series, we discussed designing deposition systems with linear substrate motion or continuous web coating. As promised, this blog will show the results of modeling of the plate coating example we defined previously.
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Designing for Rate and Uniformity Part 3: Linear Motion Systems

In the previous blogs of this series, we highlighted that the properties of the film are central to the design of a deposition instrument, with film thickness and uniformity being critical parameters for performance. Throughput predictions help to determine and maximize the system ROI. Proper design can also identify and trim away unnecessary cost elements, reducing the “I” in ROI. In part 2, we examined design considerations for rotating substrate. This blog will look at coating methods for linear motion systems.
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PVD Products Licenses Technology from The Ohio State University for Exclusive Deposition Technology Development

PVD Products, Inc. is proud to announce our entrance into an exclusive licensing agreement with The Ohio State University for thin film deposition technology developed in the University’s Department of Physics. Through this agreement, PVD will commercialize patent-pending Ohio State technology for deposition of high quality thin films via sputtering.
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