PVD Products provides innovative off-axis sputtering systems for the growth of epitaxial thin films. This low-cost, versatile system produces films of quality rivaling MBE and PLD. At the same time, it offers the simplicity of operation as any other magnetron sputtering tool. The innovation arises from the patent-pending off-axis geometry which uses unique low-pressure conditions and (optional) pressed powder targets to achieve single-crystal growth and accurate film stoichiometry.
The system can include up to six off-axis magnetron guns and three confocal magnetron guns (for doing standard sputter deposition). The 2” guns can be swapped between these two orientations, for maximum flexibility. Power supplies for DC and RF deposition are available. Substrate sizes up to 1” square can be utilized. The process gas delivery system is designed to allow a wide range of oxygen partial pressures for the ideal growth of oxides. The available UHV option allows deposition of high purity metallic layers.
By capturing the lower energy off-axis emitted atoms an epitaxial film can be formed. In addition, the use of pressed powder targets homogenizes the composition of the film across the substrate.