PLD 2000 & PLD 3000 Deposition Systems

The PLD 2000 and PLD 3000 systems provide uniform multilayer films deposited by PLD over substrates up to 3 inches in diameter. These systems include complete software packages and can be used to grow combinatorial thin films as well.

The PLD 2000 and PLD 3000 differ only in terms of their substrates and targets. The PLD 2000 can deposit uniform films on substrates up to 2 inches in diameter with four targets each up to 3 inches in diameter. Meanwhile, the PLD 3000 can deposit films on substrates up to 3 inches with three 4-inch diameter targets. These systems are designed to produce uniform films over the full substrate.

Download PLD 2000 & 3000 Brochure

PLD-3000-System-lowres-300x208.jpg

Pulsed_Laser_Deposition_yttria_3_75mm_Wafers-930x742.jpg

Yttrium oxide films deposited by pulsed laser deposition on 3-inch silicon wafers. Film thickness uniformity for all three wafers is ±1%.

inside_chamber_pld.jpg

Inside the PLD 2000 deposition chamber, showing black-body heater and target manipulator. The PLD 2000 and PLD 3000 systems share the same chamber size.

Customize A System

Do you know the specifications you need to reach?
Contact us to discuss a custom system.

Specifications

Maximum Substrate Size

The PLD 3000 system is designed to handle a single 3-inch or 2-inch diameter substrate or multiple small samples. The PLD 2000 system is designed to handle a single 2-inch diameter substrate or multiple small samples. Custom substrate holders are available on request.

Operating Pressure Range

5 x 10-7 Torr base to 300 mTorr

Target to Substrate (Throw) Distance: PLD 2000 and PLD 3000

Variable from 3.5 to 5 inches (90–127 mm) (affects maximum temperature, thickness and composition specifications)

Base Pressure of the Main Chamber: PLD 2000 and PLD 3000

P < 5 x 10-7 Torr guaranteed with system at room temperature and no targets

Maximum Substrate Temperature: PLD 3000

950°C (in oxygen) for non-transparent substrates and 850°C for transparent substrates such as LaAlO3.  No thermal paste or bonding required.  NOTE:  These are actual substrate temperatures, not heating element temperature or susceptor temperature.

Target Size: PLD 3000

Three 4-inch diameter targets (maximum diameter)

Raster Path Length: PLD 3000

3.8 inches

PLD 2000 and PLD 3000 Vacuum Chamber

Box-style chamber with easy substrate and target changes. The chamber is compatible with single or multiple magnetron sources as well as ion beam sources.

PLD 3000 Temperature Uniformity

±3°C across 3-inch diameter substrate for the PLD 3000 system

Film Thickness Uniformity

±4% over 90% of a 3-inch diameter substrate

Nominal Angle of Incidence: PLD 2000 and PLD 3000

Of the laser beam on target: 60°

Operational Wavelength

248 nm (KrF) or 193 nm (ArF).

Site Meter