Combinatorial PLD

Quickly optimize film composition. Our Nano PLD, PLD/MBE series, or larger PLD deposition systems provide a complete PLD combinatorial thin films PLD solution. 

Compositional gradients can be created via software routines and/or using programmable masks. Binary, tertiary, quaternary, etc. combinatorial films can be easily grown.

Custom systems can be provided as well. Check out our sputtering combinatorial deposition tools.

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As an example of a combinatorial thin film, below is a photograph of a 2-inch silicon wafer with a combinatorial film grown using BaTiO3, SrTiO3 and Nb targets. This film is nominally 200 nm thick, and the chemical composition varies considerably from an elemental "rich" zone to a "poor" zone directly across the wafer.

2-inch diameter Si wafer with a 250-nm thick tertiary combinatorial film


Below is a "wafer’s eye view" of a combinatorial thin film system using masks mounted on programmable actuators. The mask holders are designed to hold metal masks with various cutouts to produce a thickness gradient of a given material in the deposited thin film.

Utilizing multiple targets and masks, one can produce a variety of compositional gradients on a wafer surface in a short amount of time. Also shown is the location of the "active" 1-inch diameter ablation target pedestal in this six-target Nano PLD system. The pedestal is sitting below the water-cooled plate.

Combinatorial thin film system from the wafer’s point of view

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