PVD Products manufactures sputtering systems for depositing metal and dielectric thin films on substrates up to 300 mm in diameter. An array of magnetron sputtering sources, using RF, DC, or pulsed DC power, are operated singly or in co-deposition mode to produce a wide variety of film compositions. Our Titan magnetron sputtering sources range in size from 1 inch (25 mm) to 8 inches (200 mm) in diameter with options such as in-situ tilt for fine adjustments of the deposition profile. Substrate stages for wafers up to 300 mm in diameter are available with heating to 850°C and RF bias. The sputtering chamber may be fitted with additional ports for diagnostic tools such as a Residual Gas Analysis (RGA), Reflection High-Energy Electron Diffraction (RHEED), or ellipsometry.
PVD Products manufactures complete integrated sputtering systems to meet your specific deposition requirements. These systems can be configured with multiple RF and/or DC magnetron sources ranging in size from 1 inch (25 mm) to 8 inches (200 mm) in diameter. We can provide systems to handle wafers up to 300 mm in diameter.
PVD Products manufactures a wide variety of HV and UHV magnetron sputtering sources for various target sizes. The Titan Magnetron sputtering sources range from 1 inch to 6 inches in diameter. These sources are bakeable to 200°C with the magnets in place. Titan Magnetron magnetic field design provides excellent film uniformity and target utilization.
PVD Products provides sputtering targets for a wide range of applications from ferromagnetic, complex oxides, and semiconducting films. Our standard round target sizes range from 1 inch to 20 inches in diameter, and the rectangular targets are available in lengths up to and over 2000 mm in single or multiple piece construction, depending on the metal.
PVD Products can provide facing magnetrons for low energy impact sputtering on delicate substrate surfaces. The photo depicts a set of facing magnetrons with four distinct magnetron heads. These heads can rotate via computer control and provide for multi-layer film growth. Systems with multiple heads are readily available per your requirements.
PVD Products has designed substrate heaters for various vacuum applications based on all types of heating elements, including IR lamps, Inconel sheathed resistance heaters, boroelectric heaters, resistive wires such as platinum, molybdenum, tantalum, and tungsten, as well as electron beam bombardment heaters. We can design heaters of various sizes and shapes that work in a variety of different background gasses, including oxygen, over a wide pressure range.
PVD Products' combinatorial sputtering systems are used for growing multiple individual thin film test pads, each with a unique composition in a rectangular array onto substrates up to 300 mm in diameter. Each individual test pad has a uniform composition over the test pad area, as opposed to combinatorial systems with films grown using continuous compositional gradients.
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