PVD Products provides custom sputtering services for single or multiple small substrates or single wafers with up to 6-inch diameters. Our custom in-house sputter deposition tool can adapt a variety of sputter source heads for single-layer deposition, multilayer deposition, and co-deposition. We can provide DC, RF, or pulsed DC power sources along with RF substrate bias prior to or during deposition and heating in excess of 300°C. This system is capable of growing metals, oxides, nitrides, carbides, etc.
Our sputter system also allows us to provide combinatorial thin film deposition of multiple test pad samples on one wafer. Using our unique setup, PVD Products can provide co-deposition onto multiple pads of 1 cm square (or other sizes) of varying composition, grown at different substrate temperatures and/or RF bias levels. This tool provides for quick analysis of desired compositions and optimal growth conditions of new materials.
Using our in-house PLD/MBE 2300 system, PVD Products can provide custom PLD deposition services for substrates with up to 2-inch diameters. Multilayer films, combinatorial films, or single-layer films can be easily grown. Our in-house PLD/MBE 2300 includes a Coherent COMPex 205 excimer laser that provides up to 30 Watts of power. Substrate heating up to 950°C is available along with two UHV magnetron sputter sources and RF and DC power supplies.
A custom deposition system being built in our facility
A custom sputtering system for commercial processes and testing