One 12-inch (300-mm) or smaller diameter substrates. Multiple small substrates can be accommodated on substrate holders. Custom substrate configurations are available on request.
900°C (in oxygen) for non-transparent substrates such as silicon, and 800°C for transparent substrates such as sapphire. No thermal paste or bonding required.
±8°C across 12-inch diameter substrate
5 x 10-7 Torr base to 100 mTorr
Custom XYθ four-position 4-inch diameter target manipulator (others available on request)
±5% over 90% of 12-inch diameter substrate
System designed for 6-inch (~200-mm) throw. Throw is variable from 7.5 inches (minimum) to 9 inches maximum (affects maximum temperature, thickness, and composition specifications)
Of the laser beam on target: 60°
P < 5 x 10-7 Torr guaranteed, with system at room temperature without targets. Pressure below 5 x 10-8 Torr with optional load lock.
Box-style chamber with easy substrate and target changes
248 nm (KrF). Other wavelengths available on request.
An interior view of a PLD 12000 system with substrate heater, f4-inch diameter XYθ target manipulator and a multi-pocket electron beam evaporation source. The system is mated to a customer supplied robot and 25 wafer FOUP. The software allows programing of the full 25 wafers for continuous unattended depositions.
3-D solid model of PLD 12000 system