PLD Thin Film Deposition
PVD Products provides thin film magnetron sputtering and PLD services for R&D applications.
Sputtering Services
PVD Products provides custom sputtering services for single or multiple small substrates
or single wafers with up to 6-inch diameters. Our custom in-house sputter deposition
tool can adapt a variety of sputter source heads for single-layer deposition, multilayer
deposition, and co-deposition. We can provide DC, RF, or pulsed DC power sources
along with RF substrate bias prior to or during deposition and heating in excess
of 300° C. This system is capable of growing metals, oxides, nitrides, carbides,
etc.
Combinatorial Thin Film Deposition
Our sputter system also allows us to provide combinatorial thin film deposition
of multiple test pad samples on one wafer. Using our unique set-up PVD Products
can provide co-deposition onto multiple pads of 1 cm square (or other sizes) of
varying composition, grown at different substrate temperature, and/or RF bias levels.
Such a tool provides for quick analysis of desired compositions and optimal growth
conditions of new materials.
PLD Deposition Services
Using our in-house Nano PLD system PVD Products can provide custom PLD deposition
services for substrates with up to 2-inch diameters. Multilayer films, combinatorial
films, or single layer films can be easily grown. Our in-house Nano PLD includes
a Coherent COMPex 110 excimer laser that provides up to 30 watts of power. Substrate
heating up to 950° C is available.
Please contact us to discuss your
specific thin film application needs.