PVD Customers Spotlight – Recent News & Innovations
Stanford University (PVD technology in use: PLD):
Tsvetkov, N., Lu, Q., Sun, L., Crumlin, E., Yildiz. B. Improved chemical and electrochemical stability of perovskite oxides with less reducible cations at the surface. Nature Materials (2016), 15, 9, 1010. https://doi.org/10.1038/nmat4659
IREC Spain (PVD technology in use: PLD):
Morata, A., Siller, V., Chiabrera, F., Nuñez, M., Trocoli, R., Stchakovsky, M., and Taranćon, A. Operando probing of Li-insertion into LiMn2O4 cathodes by spectroscopic ellipsometry. J. Mater. Chem. A, 2020, 8, 11538. https://doi.org/10.1039/c9ta12723b
JNCASR, India (PVD technology in use: UHV Sputtering):
Upadhya, K., Rao, D., Biswas, B., Kumar, R., Bhatia, V., Pillai, A., Garbrecht, M., and Saha, B. Reducing high carrier concentration in rocksalt-AlxSc1-xN with Mg acceptor doping. Appl. Phys. Lett. 118, 202107 (2021). https://doi.org/10.1063/5.0052877
JNCASR, India (PVD technology in use: UHV Sputtering):
Upadhya, K., Bhatia, Pillai, A., Garbrecht, M., and Saha, B. High thermoelectric power factor in ambient-stable semiconducting rare-earth ErN thin films. Appl. Phys. Lett. 118, 132103 (2021). https://doi.org/10.1063/5.0041879
JNCASR, India (PVD technology in use: UHV Sputtering):
Acharya, S., Chatterjee, A., Bhatia, V., Pillai, A., Garbrecht, M., Saha, B. Twinned growth of ScN thin films on lattice-matched GaN substrates. Mater. Res. Bull. 143 (2021), 111443. https://doi.org/10.1016/j.materresbull.2021.111443
Technion Israel (PVD technology in use: PLD):
Klotz, D., Grave, D., and Rothschild, A. Accurate determination of the charge transfer efficiency of photoanodes for solar water splitting. Phys. Chem. Chem. Phys., 2017, 19, 20383. https://doi.org/10.1039/c7cp02419c
AIST, Japan (PVD technology in use: PLD)
Develos-Bagarinao, K., Ishiyama, T., Kishimoto, H. et al. Nanoengineering of cathode layers for solid oxide fuel cells to achieve superior power densities. Nat Commun 12, 3979 (2021). https://doi.org/10.1038/s41467-021-24255-w