VIS/NIR Resonant PLD/MAPLE System
VIS/NIR Resonant MAPLE PLD System with dual wafer loadlock
Overview
The VIS/NIR Resonant PLD/MAPLE Process
This process uses a frequency doubled Nd:YAG laser to pump an OPO. The output
of the OPO ranges from about 680 - 2,400 nm with pulse lengths of a few ns. The
energy per pulse varies strongly on wavelength ranging from about 120 mJ in the
VIS and drops to about 15 mj in the IR. By tuning the wavelength of the laser
the customer may be able to couple to vibrational bands of specific materials to
provide very strong coupling to the target material. This can yield high
deposition rates with little target damage, especially for polymer materials.
This process can also be used with MAPLE targets as well
Design
PVDÕs VIS/NIR Resonant PLD/MAPLE system is built around our popular Nano
PLD chamber with large hinged front door for easy access to internal
components. This provides for easy transfer through the front door.
The system includes a complete enclosed optical train and laser beam
rastering, turbo pump package, and lap top computer control utilizing
Lab View software. Valve packages can be manual or electropneumatic as
required. A wide variety of standard options are available.
System Specifications
Maximum substrate size
One 3" or 2" wafer or multiple small samples. Larger and custom substrate holders are available on request.
Maximum substrate temperature
300° C typical, but other heaters are available on request
Operating Pressure Range
Base pressure to 200 mTorr, may depend on solvent mix for MAPLE targets
Target number and sizes
Typically 2" diameter for solid targets, 1.5" for single MAPLE target, other arrangements available on request
Target to Substrates (Throw) Distance
Variable from 2.5 to 4 inches
Base Pressure of Main Chamber
P < 5 x 10-7 Torr guaranteed with system at room temperature and no polymer targets
Operational Wavelengths
~680 - 2,400 nm
Please contact us for site prep information.