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PLD/MBE 2300 and 2500

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Overview

PLD 2300

The PLD/MBE-2300 and -2500 systems are larger versions of the PLD/MBE-2100 system. These larger systems are based around a 304L SS chamber that is 18" in diameter and 18" high. The chambers have a large top flange that seals against the chamber flange by a pair of Viton O-rings. For UHV applications the gap between the Viton O-rings can be differentially pumped. The flange includes an electric hoist to allow easy access to the internal parts of the chamber. The chambers includes a number of flanges for viewing the target, substrate, ablation plume as well as additional accessories such as HP RHEED, emission spectroscopy, pyrometery, residual gas analyzers, etc.

The rear of the PLD-2300 chamber is fitted with three angled 6.75" CF ports aimed at the substrate for the addition of UHV magnetron sputter sources or atom or ion sources, or effusion cells. With the three ports you can provide any mix of such sources.

The PLD/MBE-2500 chamber includes four 4.5" CF flanges and one 6" CF flange all directed at the substrate for holding up to five effusion cells and atom sources, or four such sources with one magnetron sputter source. The chambers include an internal light to provide excellent viewing of samples, target, and substrate transfers via our optional dual-wafer loadlock. The chambers also include a set of internal SS shields that can be easily removed for cleaning when ablated material build up becomes significant on the side walls. Due to limited access cleaning of the walls of spherical chambers is not very easy to do. Furthermore the PLD/MBE systems turbo pump comes off the side of the chamber so if small parts or samples are dropped into the system they don't drop onto the gate valve or into the turbo pump when located on the bottom of a chamber where sever damage can occur.

The PLD/MBE-2300 and -2500 chambers are mounted on a steel support frame with an electronics rack and aluminum table top that supports an integrated optical train. A second frame that includes a pair of standard electronic racks houses additional system electronics. Furthermore, this frame serves as the support table for the excimer laser providing a compact layout. Other types of lasers can be accommodated as well.

The PLD/MBE-2300 and -2500 chambers are pumped by a Pfeiffer 700 l/sec turbo pump backed by an Edwards XDS 10 dry scroll pump. Both systems include a VAT Series 64 closed-loop pressure control gate valve with PM-5 controller to provide rock-steady deposition pressures from 1 to 500 mTorr.

Standard systems include a single MFC and additional MFCs are easily added on as needed. Vacuum gauging includes a Bayard Alpert ion gauge, two Convectron gauges, and a capacitance manometer. The base pressure of the system is 5 x 10-7 Torr standard, 5 x 10-8 Torr with optional loadlock, and below 5 x 10-9 Torr with optional UHV package.

The PLD/MBE-2300 and -2500 each comes with a target manipulator that handles six 2-inch diameter targets. Targets are held in pedestals by gravity so target clamping is not required. Smaller 1" diameter targets or other small sizes can easily be accommodated with optional inserts. The target manipulator is based on a dual-axis rotary feedthrough that provides programmable target rotation speeds up to 50 RPM, programmable target indexing, and target toggling for enhanced use of target material. This robust dual-axis feedthrough provides extended lifetime when compared with other vendor's bellows sealed target manipulators that fail due to fatigue of the feedthrough bellows due to target motion. All the targets are covered by a water-cooled plate with a slot that exposes the laser beam to the active ablation target. This protects the other targets from cross-contamination as well as protects the feedthroughs gears and bearings from the thermal radiation from the SiC substrate heater. The water-cooled plate includes a removable cover that will expose a single target at a time for fast target transfers through a quick-access door located on the side of the chamber.

The PLD/MBE-2300 and -2500 systems both come with a SiC or lamp heater capable of heating silicon and other non-transparent substrates to 950° C and transparent substrates to 850° C. Note: PVD is quoting substrate temperatures- not heating element temperatures. There can be a large difference between the element and substrate temperature. The heater can handle 2-inch diameter substrates or multiple smaller samples per the customer requirements (i.e. a holder for four 1 cm square samples). Using a Ferro fluidic rotary feedthrough substrates can be rotated via computer at rates up to 40 RPM. The heater is typically mounted to a large motorized Z-stage providing computer controlled target to substrate distances varying from about 55 to 105 mm. The open architecture of our heaters is ideal for in-situ analysis using HP RHEED, and alternative deposition sources such as magnetron sputtering, effusion cells, ozone generators, atom or ion sources, etc. Multiple such sources can be added to these chambers. The electronics racks include space and electrical receptacles for power supplies to drive these types of sources.

The PLD/MBE-2300 or -2500 systems come with a complete excimer based (or other) integrated optical train that includes the ability to raster the laser across the target surface via computer control. This provides both excellent target utilization as well as film thickness uniformity. The optical train also includes our Intelligent Window to keep your optical path clean for an extended period of time. The optical train is enclosed in a laser safe enclosure and all view ports include laser safety covers. Our systems also include the ability to open and close the excimer laser shutter via computer control.

The PLD/MBE-2300 and -2500 each can be integrated with a variety of excimer lasers. Our excimer laser packages include a gas cabinet with the proper regulators for the laser pre-mix and He purge gasses.