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PLD/MBE 2100

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Overview

PDF PLD 2100

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PLD/MBE 2100 System with COMPex 205 Excimer Laser

The PLD/MBE 2100 system is the smallest of the three PLD/MBE 2000 series systems yet includes all the key features of these systems. It is based around a 304L SS chamber that is 16" in diameter and 18" high. The chamber has a top flange that seals against the chamber flange by a pair of Viton O-rings. For UHV applications the gap between the Viton O-rings can be differentially pumped. The flange includes an electric hoist to allow easy access to the internal parts of the chamber. The chamber includes a number of flanges for viewing the target, substrate, ablation plume as well as additional accessories such as HP RHEED, emission spectroscopy, pyrometery, residual gas analyzers, etc. The rear of the chamber is fitted with one angled 6" CF port for the addition of an atom or ion source, effusion cell, or magnetron sputter source. The chamber includes an internal light to provide excellent viewing of samples, target, and substrate transfers via our optional dual-wafer loadlock. The walls of the chamber have a set of internal SS shields that can be easily removed for cleaning when ablated material build up becomes significant. Due to limited access cleaning the walls of spherical chambers is not very easy to do. Furthermore, the PLD/MBE systems turbo pump comes off the side of the chamber protecting the pump from small parts or samples that may be dropped inadvertently into the system.

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Inside a PLD/MBE 2100 with a 2" Magnetron Sputter Source along with the Six Position Target Carousel

The PLD/MBE 2100 chamber is mounted on a steel support frame with an integrated optical train. A second frame is provided that includes a pair of standard 19" wide electronic racks which houses all the system electronics. Furthermore, this frame serves as the support table for the excimer laser providing a compact layout. Other types of lasers can be accommodated as well. With the laser located on top of the racks it is readily accessible for service when required.

The PLD/MBE-2100 chamber is pumped by a Pfeiffer 500 l/sec turbo pump backed by an Edwards XDS 10 dry scroll pump. The system includes a VAT Series 64 closed-loop gate valve with PM-5 pressure controller to provide rock-steady deposition pressures from 1 to 500 mTorr.

Standard systems include a single MFC and additional MFCs are easily added as needed. Vacuum gauging includes a Bayard Alpert ion gauge, two Convectron gauges, and a capacitance manometer. The base pressure of the system is 5 x 10-7 Torr standard, 5 x 10-8 Torr with optional loadlock, and below 5 x 10-9 Torr with optional UHV package.

The PLD/MBE-2100 comes with a target manipulator that handles six (6) 2-inch diameter targets. Targets are held in pedestals by gravity so target clamping is not required. Smaller 1" diameter targets or other small target sizes can easily be accommodated with optional inserts. The target manipulator is based on a dual-axis rotary feedthrough that provides programmable target rotation speeds up to 50 RPM, programmable target indexing, and target toggling for enhanced use of target material. This robust dual-axis feedthrough provides extended lifetime when compared with other vendor's bellows sealed based target manipulators that fail due to fatigue of the feedthrough bellows due to constant target motion and indexing. All the targets are covered by a water-cooled plate with a slot that exposes the laser beam to the active ablation target. This plate protects the other targets from cross-contamination as well as protects the assembly's gears and bearings from the thermal radiation from the SiC substrate heater. The water-cooled plate includes a removable cover that will expose a single target at a time for fast target transfers through a quick-access door located on the side of the chamber.

The PLD/MBE 2100 system comes with a either a SiC or lamp based heater capable of heating silicon and other non-transparent substrates to 950° C and transparent substrates to 850° C. Note: PVD is quoting substrate temperatures- not heating element temperatures (there is a large difference in temperature between the element and the substrate on all heaters). The heater can handle 2-inch diameter substrates or multiple smaller samples per the customer requirements (i.e. a holder for four 1 cm square samples). Using a Ferro fluidic rotary feedthrough substrates can be rotated via computer at rates up to 40 RPM. The heater is typically mounted to a large motorized Z-stage providing computer controlled target to substrate distances varying from about 50 to 100 mm. The open architecture of our SiC heater is ideal for in-situ analysis using HP RHEED, and alternative deposition sources such as magnetron sputtering, effusion cells, ozone generators, atom or ion sources, etc. One of these deposition sources can be mounted on the PLD/MBE 2100 chamber at a time.

The PLD/MBE-2100 comes with a complete excimer based (or other) integrated optical train that includes the ability to raster the laser across the target surface via computer control. This provides both excellent target utilization as well as film thickness uniformity. The optical train also includes our Intelligent Window to keep your optical path clean for an extended period of time. The optical train is enclosed in a laser safe enclosure and all view ports include laser safety covers. Our systems also include the ability to open and close the excimer laser shutter via computer control.

The PLD/MBE 2100 can be integrated with a variety of excimer lasers. Our excimer laser packages include a gas cabinet with the proper regulators for the laser pre-mix and He purge gasses.