PLD/MBE 2100
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Overview
PLD 2100
PLD/MBE 2100 System with COMPex 205 Excimer Laser
The PLD/MBE 2100 system is the smallest of the three PLD/MBE 2000 series
systems yet includes all the key features of these systems. It is based
around a 304L SS chamber that is 16" in diameter and 18" high. The chamber
has a top flange that seals against the chamber flange by a pair of Viton
O-rings. For UHV applications the gap between the Viton O-rings can be
differentially pumped. The flange includes an electric hoist to allow easy
access to the internal parts of the chamber. The chamber includes a number
of flanges for viewing the target, substrate, ablation plume as well as
additional accessories such as HP RHEED, emission spectroscopy, pyrometery,
residual gas analyzers, etc. The rear of the chamber is fitted with one
angled 6" CF port for the addition of an atom or ion source, effusion cell,
or magnetron sputter source. The chamber includes an internal light to
provide excellent viewing of samples, target, and substrate transfers via
our optional dual-wafer loadlock. The walls of the chamber have a set of
internal SS shields that can be easily removed for cleaning when ablated
material build up becomes significant. Due to limited access cleaning the
walls of spherical chambers is not very easy to do. Furthermore, the
PLD/MBE systems turbo pump comes off the side of the chamber protecting the
pump from small parts or samples that may be dropped inadvertently into the
system.
Inside a PLD/MBE 2100 with a 2" Magnetron Sputter Source along with the Six Position Target Carousel
The PLD/MBE 2100 chamber is mounted on a steel support frame
with an integrated optical train. A second frame is provided that includes
a pair of standard 19" wide electronic racks which houses all the system
electronics. Furthermore, this frame serves as the support table for the
excimer laser providing a compact layout. Other types of lasers can be
accommodated as well. With the laser located on top of the racks it is
readily accessible for service when required.
The PLD/MBE-2100
chamber is pumped by a Pfeiffer 500 l/sec turbo pump backed by an Edwards
XDS 10 dry scroll pump. The system includes a VAT Series 64 closed-loop
gate valve with PM-5 pressure controller to provide rock-steady deposition
pressures from 1 to 500 mTorr.
Standard systems include a single MFC
and additional MFCs are easily added as needed. Vacuum gauging includes a
Bayard Alpert ion gauge, two Convectron gauges, and a capacitance manometer.
The base pressure of the system is 5 x 10-7 Torr standard, 5 x 10-8 Torr
with optional loadlock, and below 5 x 10-9 Torr with optional UHV
package.
The PLD/MBE-2100 comes with a target manipulator that
handles six (6) 2-inch diameter targets. Targets are held in pedestals by
gravity so target clamping is not required. Smaller 1" diameter targets or
other small target sizes can easily be accommodated with optional inserts.
The target manipulator is based on a dual-axis rotary feedthrough that
provides programmable target rotation speeds up to 50 RPM, programmable
target indexing, and target toggling for enhanced use of target material.
This robust dual-axis feedthrough provides extended lifetime when compared
with other vendor's bellows sealed based target manipulators that fail due
to fatigue of the feedthrough bellows due to constant target motion and
indexing. All the targets are covered by a water-cooled plate with a slot
that exposes the laser beam to the active ablation target. This plate
protects the other targets from cross-contamination as well as protects the
assembly's gears and bearings from the thermal radiation from the SiC
substrate heater. The water-cooled plate includes a removable cover that
will expose a single target at a time for fast target transfers through a
quick-access door located on the side of the chamber.
The PLD/MBE
2100 system comes with a either a SiC or lamp based heater capable of
heating silicon and other non-transparent substrates to 950° C and
transparent substrates to 850° C. Note: PVD is quoting substrate
temperatures- not heating element temperatures (there is a large difference
in temperature between the element and the substrate on all heaters). The
heater can handle 2-inch diameter substrates or multiple smaller samples per
the customer requirements (i.e. a holder for four 1 cm square samples).
Using a Ferro fluidic rotary feedthrough substrates can be rotated via
computer at rates up to 40 RPM. The heater is typically mounted to a large
motorized Z-stage providing computer controlled target to substrate
distances varying from about 50 to 100 mm. The open architecture of our SiC
heater is ideal for in-situ analysis using HP RHEED, and alternative
deposition sources such as magnetron sputtering, effusion cells, ozone
generators, atom or ion sources, etc. One of these deposition sources can
be mounted on the PLD/MBE 2100 chamber at a time.
The PLD/MBE-2100
comes with a complete excimer based (or other) integrated optical train that
includes the ability to raster the laser across the target surface via
computer control. This provides both excellent target utilization as well
as film thickness uniformity. The optical train also includes our
Intelligent Window to keep your optical path clean for an extended period of
time. The optical train is enclosed in a laser safe enclosure and all view
ports include laser safety covers. Our systems also include the ability to
open and close the excimer laser shutter via computer control.
The
PLD/MBE 2100 can be integrated with a variety of excimer lasers. Our
excimer laser packages include a gas cabinet with the proper regulators for
the laser pre-mix and He purge gasses.