PLD 2000/3000
The PLD 2000 and 3000 differ only in terms of their substrates and targets. The
PLD 2000 can deposit uniform films on substrates up to 2" in diameter with four
targets up to 3" in diameter each. Meanwhile, the PLD 3000 can deposit films on
substrates up to 3" with three 4" targets.
System Specifications
PLD 3000
Maximum substrate size
One 3 inch diameter or one 2 inch diameter substrate or multiple small samples.
Custom substrate holders available on request.
Maximum substrate temperature
950°C (in oxygen) for non-transparent substrates and 850°C for transparent substrates
(such as LaAlO3). No thermal paste or bonding required.
Temperature uniformity
Inside the deposition chamber
± 3°C across 3 inch diameter substrate
Operating Pressure Range
5 x 10-7 Torr base to 300 mTorr
Target Size
Three 4 inch diameter targets (maximum diameter)
Film Thickness Uniformity
Another view of the PLD 3000
± 4% over 90% of a 3 inch diameter substrate
Film Characteristics
Tc > 87 K ± 1 K over 3 inch area for YBCO deposited on LaAlO3
substrates.
Jc > 1.5 MA/cm2 over 3 inch area for YBCO deposited on LaAlO3
substrates
Film Compositional Uniformity
± 1.5 atomic percent over a 3 inch substrate for most materials such as YBCO using
a 4 inch diameter target and programmable laser beam rastering, and a 5 inch throw.
(Uniformity of materials with high vapor pressures such as Lithium may vary significantly
depending on deposition parameters)
Target to Substrate (Throw) Distance
Variable from 3.5 to 5 inches (90 – 127 mm) (effects maximum temperature, thickness
and composition specifications)
Raster path length
3.8 inches
Nominal Angle of Incidence
of the laser beam on target: 60°
Base Pressure of the Main Chamber
P < 5 x 10-7 Torr guaranteed with system at room temperature and no targets.
Vacuum Chamber
Box style chamber with easy substrate / target changes. The chamber is compatible
with single or multiple magnetron sources as well as ion beam sources.
Operational Wavelength
248 nm (KrF) or 193 nm (ArF).
Please contact us for site prep information.