Nano PLD System
The inside of a Nano PLD chamber reveals a target manipulator, substrate heater,
and shutter assembly
Our low-cost Nano PLD System is designed for researchers interested in small-scale
thin film materials development. Though a more basic system, this tool doesn't compromise
most of the key features of our sophisticated PLD 3000
and PLD 5000 systems.
Design
Nano PLD system with optional Intelligent Window
The Nano PLD system is based on our user-friendly rectangular box chamber design
that provides ease of transfer for both substrates and targets through the large,
front mounted hinged door. The turbo pump is safely mounted off the back wall. The
target manipulator uses our long-life, magnetically coupled rotary feedthrough.
Our substrate heater uses IR lamps with a water-cooled housing. The unit has a small
footprint and can operate off a laptop computer.
Specifications
Nano PLD wafer holders
Maximum Substrate Size
One 2 inch diameter substrate or multiple small samples.
Maximum substrate temperature
950 ± 4° C (in oxygen) using silver paste (optional non-contact heaters available)
Operating Pressure Range
5 x 10 -7 Torr base to 500 mTorr
NanoPLD System with integrated Excimer Laser Thanks to Professor V. Harris, Northeastern
University
Target Size
Either three 2-inch diameter targets (maximum diameter) or six 1-inch diameter targets.
(other arrangements may be available on request)
Nominal Angle of Incidence
Laser beam on target: 60° with respect to target normal
Base Pressure of the Main Chamber
P < 5 x 10 -7 Torr guaranteed with system at room temperature using a
210 l/sec turbo pump
Vacuum Chamber
A set of programable shutters to hold masks during combinatorial thin film deposition
10-inch square box style chamber with hinged front door providing quick and easy
substrate/target changes. The chamber is designed to handle the addition of a magnetron
sputter source or an ion beam source. Includes ports for target and substrate viewing,
emission or absorption spectroscopy, and the addition of an optional load lock etc.
Standard Operational Wavelengths
248 nm (KrF), 193 nm (ArF), or 266 nm (Nd:YAG). Other wavelengths available on request.
Optical beam line enclosure included.
Nano PLD Options
Computer control of target motion, substrate temperature, MFC flow rates, and laser
functions. Other options include additional MFC’s, RHEED ports, Load-Lock, magnetron
sputter source, ion source, substrate rotation, laser beam rastering, Intelligent
Window, etc.
Please contact us for site prep information.