Coated Conductor Systems

PVD Products can provide a full range of coated conductor systems for deposition of HTS materials and buffer layers. We have a wide range of product offering including:

• PLD Systems
• Sputter Deposition Systems
• IBAD Deposition (evaporation and sputtering)

IBAD Deposition Overview

PVD Products provides CC IBAD Deposition Systems for the growth of MgO or other types of buffer layers on metal tapes. Using our current in-house technology we can provide the following two types of IBAD systems for the deposition of MgO

MgO deposition via Evaporation with IBAD and EPI film Growth

This approach uses a two chamber system. Each chamber houses one reel along with a large electron beam evaporation unit. The IBAD chamber can includes a linear RF ion source along with complete deposition control, in-situ scanning RHEED, and other capabilities as requested. The second chamber includes a high temperature heater and electron beam evaporation unit for the growth of EPI MgO on the metal tape. Tape speeds can vary depending on the system design from about 20 to 200 m/hour.

MgO deposition via Sputtering IBAD

This approach uses two RF ion sources. One ion source is used to sputter a large water-cooled rectangular MgO target onto water cooled tape. The second source is directed at the substrate surface at an AOI of 45° to orient the MgO film. Tape speeds will vary from about 5 to 20 m/hour depending on overall system design.

Additional Features

Both systems use our field proven tape transport capability with in-situ tension and speed control and multi lanes when required. All systems come with computer control software and data logging of all relevant deposition parameters. Deposition rate depends strongly on many factors specific to each application.

PVD Products can provide specific systems to meet your CC IBAD requirements. Please contact us for more information.