Evaporation/IBAD Systems
Electron beam evaporation source unit with dual rotating, multi-pocket guns.
PVD Products' complete thermal and electron beam evaporation systems are designed
to meet the customer’s specific deposition needs. These systems can contain single
or multiple thermal sources, multi-pocket e-beam sources, and multi-gun sources
as required. Linear e-beam sources are also available.
Our evaporation systems come complete with power supplies, sweep controls, and quartz
crystal deposition rate monitors for closed-loop feedback control. Additionally,
these systems can be operated manually or via computer control.
Power and ion sources
Fiber-coating system
Systems come complete with power supplies and deposition rate monitors for closed
loop feedback control. Substrate planetary or rotation stages can include heating
to temperatures in excess of 900 °C depending on substrate size and materials. Furthermore,
Kaufman, End Hall, and RF ion sources for Ion Beam Assisted Deposition (IBAD) or
substrate pre-cleaning can be easily integrated into our deposition chambers.
Pumping packages
All of our evaporation systems come complete with appropriate pumping packages (cryo
or turbo pumps depending on system requirements), wet or dry mechanical pumps, manual
or electro-pneumatic valves, all necessary vacuum gauges, complete power distribution,
electronic rack, water and air manifolds, safety interlocks, etc.
Additional Equipment
Multi-wafer planetary domes, and substrate heaters can be provided for various substrate
shapes and sizes. Load-locks are available for substrates up to 8-inchs (200 mm)
in diameter. Vacuum systems can be designed with base pressures below 10-9
Torr.
Please contact us to discuss your
specific evaporation requirements.
Two source, single pocket evaporator used to deposit thick oxide films onto metallic
substrates held at 1000° C in 1 mTorr of oxygen.
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6 cm RF ion source in a production evaporation system
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