December 14, 2007 PVD Products has been awarded a Phase I SBIR entitled "High-Throughput Experimentation Physical Vapor Deposition (PVD) Chamber for Accelerated Microelectronics Materials Research and Development" from the Defense Microelectronics Activity group located in McClellan, CA. Under this program, PVD Products will design a system for co-sputtering using novel heating techniques to grow a large library of thin films of varying compositions and microstructures. The goal of this Phase I SBIR program is to provide the design of a large multi-source system with the capability of growing a minimum of 100 test pad combinations of materials on a 200 mm diameter wafer.

December 7, 2007 PVD Products has successfully completed the installation of a unique MAPLE/IRRPLD system at Jefferson Lab, Newport News, Virginia. This system will utilize the unique properties of the JLab's Free Electron Laser to deposit a variety of polymer films. The system includes three rotating frozen MAPLE Targets as well as three solid targets along with a 4-inch substrate heater and loadlock. Both Matrix Assisted Pulsed Laser Evaporation and Infrared Resonant Pulsed Laser Depositon can be conducted in the same system.

October 12, 2007 PVD Products has successfully completed the installation of its third turnkey coated conductor PLD tape machine at Shanghai Jiao Tong University. These machines have been used to deposit REBCO thin films onto 1 cm wide tapes over 200 meters long, with critical currents above 240 amps. This system utilizes a multi-roll contact style heater and can deposit both buffer layers and superconductors and makes use of PVD Products' unique target manipulator.

August 15, 2007 PVD Products successfully completed the installation of a unique PLD system at the University of Leeds in England. This system has two complete optical trains for growing thin films. One optical train is for a FS laser operating at 800 nm, and one optical for an excimer laser operating at either 248 or 193 nm.