Phase I SBIR Awarded

PVD Products has been awarded a Phase I SBIR entitled "High-Throughput Experimentation Physical Vapor Deposition (PVD) Chamber for Accelerated Microelectronics Materials Research and Development" from the Defense Microelectronics Activity group located in McClellan, CA. Under this program, PVD Products will design a system for co-sputtering using novel heating techniques to grow a large library of thin films of varying compositions and microstructures. The goal of this Phase I SBIR program is to provide the design of a large multi-source system with the capability of growing a minimum of 100 test pad combinations of materials on a 200 mm diameter wafer.